| 1 | Multi-cathodic-arc PVD batch system | Reactive cathodic arc evaporation | TiAlN, AlCrN, and related nitride coatings for carbide drills used in metal cutting. | Arc cathodes, reactive-gas inlets, substrate-bias power supply, vacuum chamber, planetary fixture, heating and cooling system. | Typical coating thickness: about 1–4 μm; common tool-coating temperatures are approximately 400–500°C, depending on the recipe. Assess droplet control and fixture coverage for small diameters. |
| 2 | Filtered cathodic-arc PVD system | Filtered arc deposition | Dense carbon-based hard coatings, including ta-C, where a smoother surface and reduced macroparticle defects are priorities. | Arc source, magnetic or duct filter, vacuum chamber, substrate-bias supply, gas controls, and rotating tool holder. | Coating thickness and substrate heating are highly process-dependent. Filtering can reduce arc droplets, but may lower deposition rate and usable coating area. |
| 3 | HiPIMS magnetron sputtering system | High-power impulse magnetron sputtering | Dense nitride coatings such as CrN- or Al-containing nitrides for wear-resistant cutting tools. | HiPIMS pulsed-power supply, magnetron targets, reactive-gas control, bias supply, vacuum pumps, and rotating fixtures. | Typical tool-coating thickness is around 1–4 μm; substrate temperature varies by coating design and can be several hundred degrees Celsius. Compare deposition rate and edge coverage with the required production volume. |
| 4 | Reactive magnetron sputtering system | DC or pulsed-DC reactive sputtering | TiN, CrN, and other nitride coatings for drills where controlled composition and a relatively smooth film are useful. | Magnetron cathodes and targets, pulsed-DC supply, mass-flow controllers, vacuum chamber, substrate bias, and multi-axis tool fixtures. | Coating thickness is commonly in the 1–4 μm range for cutting-tool applications. Stable gas-flow control and uniform rotation are important for repeatable results. |
| 5 | Hybrid arc-and-magnetron PVD system | Combined cathodic arc and magnetron sputtering | Multilayer or compositionally varied nitride coatings, combining different source characteristics within one process. | Arc cathodes, magnetron targets, independent power supplies, gas controls, substrate-bias unit, and planetary fixture system. | Many tool coatings fall around 1–4 μm and use temperatures in the several-hundred-degree range. Confirm that the control system can coordinate sources and repeat multilayer sequences. |
| 6 | PACVD coating system for carbon films | Plasma-assisted chemical vapor deposition | a-C:H DLC coatings that can provide low friction in suitable materials and cutting conditions. | RF or pulsed plasma power supply, precursor-gas delivery, vacuum chamber, substrate-bias unit, temperature control, and rotating fixtures. | Carbon-film thickness is often approximately 0.5–3 μm. Some processes operate at comparatively low substrate temperatures, but the actual temperature and adhesion depend on the chemistry and pretreatment. |
| 7 | High-temperature CVD coating system | Thermal chemical vapor deposition | TiC, TiCN, and oxide-containing coating systems, mainly for cemented-carbide tools designed for CVD processing. | High-temperature reactor, gas-distribution system, exhaust treatment, temperature-control assembly, reaction-gas safety controls, and loading fixtures. | Industrial CVD coatings can be several micrometres thick, often about 5–15 μm; process temperatures are typically much higher than PVD, commonly around 800–1,050°C. Check carbide grade and edge-strength requirements carefully. |
| 8 | Integrated plasma-nitriding and PVD duplex system | Plasma nitriding followed by PVD coating | A nitrided diffusion zone beneath a hard PVD topcoat; may be considered for compatible tool substrates and applications. | Plasma-nitriding power supply, gas system, vacuum chamber, PVD sources, substrate-bias unit, temperature controls, and separate process recipes. | The nitrided zone is a diffusion layer, not a deposited film; the PVD topcoat is commonly around 1–4 μm. Nitriding and coating temperatures are recipe-dependent; check substrate tempering limits and micro-drill edge integrity. |
| 9 | Planetary-fixture PVD batch machine | Arc or sputter PVD with multi-axis substrate rotation | Common hard nitride coatings for batches of drills, with fixture rotation intended to improve exposure across tool surfaces. | Planetary rotation stages, tool-specific holders, vacuum chamber, PVD sources, bias supply, gas controls, and temperature monitoring. | Typical cutting-tool films are approximately 1–4 μm, with process temperature set by coating chemistry and substrate. Review shadowing, loading density, runout protection, and batch-to-batch uniformity. |
| 10 | Load-lock, multi-chamber PVD production cell | Batch or semi-continuous PVD with isolated loading and coating zones | Production coating of carbide micro drills using suitable arc or magnetron recipes; the coating itself depends on the installed source technology. | Load-lock chamber, transfer mechanism, process chamber, vacuum pumps, PVD sources, gas and power controls, and automated handling system. | Coating thickness and temperature follow the selected PVD process, commonly around 1–4 μm for tool coatings. Load-locks can reduce process-chamber venting time; compare throughput, maintenance access, and fixture capacity. |